I. Rich Practical Cases
Extensive Validation: We have designed, manufactured, and delivered hundreds of specialized high-temperature furnaces for PI film carbonization and graphitization processing to numerous leading enterprises both domestically and internationally, with equipment specifications ranging from small-scale R&D to large-scale continuous production.
Mature Process: The long-term stable operation performance of these equipment proves that our technical solutions fully meet the stringent requirements of PI film graphitization regarding temperature uniformity, atmosphere purity, and transmission stability.
II. Core Technical Key Points
Ultra-High Temperature and High Uniformity: Requires high temperatures of 2800-3200°C, with extremely high temperature field uniformity within the effective heating zone (typically required to be ≤±10°C) to ensure consistent performance of the entire roll of PI film.
High-Purity Atmosphere Protection: Must use high-purity argon with extremely low dew point as the protective atmosphere to strictly prevent微量 oxygen from causing oxidation erosion to the PI film at high temperatures.
Continuous Transmission System: For continuous graphitization furnaces, precise tension control and smooth transmission mechanisms are needed to ensure the PI film does not deviate, wrinkle, or break at high temperatures.
Volatile Product Handling: PI film releases volatile small molecules at high temperatures. The furnace body needs an efficient exhaust system design to prevent carbon deposition from affecting product quality and equipment lifespan.