I. Rich Practical Cases
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Extensive Validation:We have designed, manufactured, and delivered hundreds of specialized high-temperature furnaces for PI film carbonization and graphitization processing to numerous leading enterprises both domestically and internationally, with equipment specifications ranging from small-scale R&D to large-scale continuous production.
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Mature Process:The long-term stable operation performance of these equipment proves that our technical solutions fully meet the stringent requirements of PI film graphitization regarding temperature uniformity, atmosphere purity, and transmission stability.
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II. Core Technical Key Points
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Ultra-High Temperature and High Uniformity:Requires high temperatures of 2800-3200°C, with extremely high temperature field uniformity within the effective heating zone (typically required to be ≤±10°C) to ensure consistent performance of the entire roll of PI film.
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High-Purity Atmosphere Protection:Must use high-purity argon with extremely low dew point as the protective atmosphere to strictly prevent微量 oxygen from causing oxidation erosion to the PI film at high temperatures.
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Continuous Transmission System:For continuous graphitization furnaces, precise tension control and smooth transmission mechanisms are needed to ensure the PI film does not deviate, wrinkle, or break at high temperatures.
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Volatile Product Handling:PI film releases volatile small molecules at high temperatures. The furnace body needs an efficient exhaust system design to prevent carbon deposition from affecting product quality and equipment lifespan.
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