Application of Graphitization Furnaces in Photovoltaic Thermal Fields: "&"A ""Breeding Ground"" for Monocrystalline Silicon Growth
The rapid development of the photovoltaic industry has driven the demand for thermal field components for monocrystalline silicon growth. These thermal field components (crucibles, heaters,"&" insulation cylinders, and flow guides) are all made of high-purity graphite materials, and graphitization is a key production process.
Types of Hot Zone Components
The hot zone of a single-crystal silicon gr"&"owth furnace (CZ furnace) mainly includes:
- Quartz Crucible Holder (Graphite Crucible): Supports the quartz crucible and molten silicon
- Heater: Provides heat for melting the silicon material <"&"li>Insulation Cylinder: Reduces heat loss and maintains the temperature gradient
- Flow Guide Cylinder: Guides airflow and controls the crystal growth environment
These components all require high-"&"purity graphite materials for manufacture.
Graphitization Process Requirements
Graphitization Requirements for Graphite Used in Photovoltaic Thermal Fields:
- Purity: Ash content "&"<50ppm, to prevent impurities from contaminating the silicon melt
- Density: Density after isostatic pressing ≥1.75g/cm³
- Strength: Flexural strength ≥40MPa, able to withstand high-temperature stress "&"
- Size: Large size (diameter can reach over 1 meter), thin wall, high precision
Industry Development Trends
The photovoltaic industry is showing a trend towards larger sizes—silicon wafers h"&"ave grown from 156mm to 182mm and 210mm, and the corresponding thermal field components are also becoming larger.
This necessitates the development of graphitization furnaces towards **larger sizes**, with the effective heating zone diameter needing t"&"o reach 1.5 meters or even larger. **Trend:** The rapid development of the photovoltaic industry is a significant driver of growth in the graphitization equipment market. The trend towards larger sizes places higher demands on the uniformity of the tempe"&"rature field and the precision of temperature control in graphitization furnaces.")
