Name: Dual Vertical Circular CVD Furnace|YuanHang
Brand: YuanHang
Availability: InStock

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Dual Vertical Circular CVD Furnace

Production Advantage: Utilizing a dual-furnace parallel design sharing a single power supply and control system, enabling alternating heating operation which significantly enhances equipment turnover rate and production efficiency. Core Performance: Designed for a maximum temperature of 2100°C, specifically developed for CVD deposition and CVI infiltration processes, suitable for long-cycle densification treatment of carbon/carbon composites. Intelligent Integration: Equipped with multi-zone precision tungsten-rhenium thermocouples, mass flow controllers, and Siemens PLC automated control, ensuring high consistency in deposition thickness and quality for each batch of products.

Product details

Overview

The dual vertical circular CVD furnace is a high-efficiency system developed by Yuanhang Industrial Furnace for the batch production of high-performance composite materials (C/C, C/SiC). This equipment introduces precursor gases into a high-temperature reaction chamber under vacuum or protective atmosphere, forming dense coatings on substrate surfaces or filling pores through chemical vapor infiltration (CVI), thereby enhancing the mechanical properties of the materials.

Image: Yuanhang Industrial Furnace - Dual Vertical Circular CVD Furnace (Actual On-Site Photo)

Features

?? Dual-Furnace High Efficiency: A single power supply system supports two furnaces, enabling seamless transition by allowing one furnace to heat or deposit while the other cools and unloads.
?? Ultra-High Temperature Environment: Operating temperature of 2000°C (max design 2100°C) ensures crystallinity and quality of deposited products.
?? Precision Gas Distribution: Multi-channel gas delivery system with Sevenstar mass flow controllers guarantees uniform distribution of reactive gases within the circular chamber.
?? Fully Automated Process Control: Siemens PLC integrated with Shimaden precision instruments enables real-time recording, querying, and historical data export of process parameters.

Specs

Equipment Model	YHGYL-CJL Series (Dimensions customizable)
Heating Method	Isostatic Graphite Resistance Heating (Low-Voltage, High-Current Temperature Control)
Temperature Uniformity	≤ ±3℃(During Soaking Stage)
Ultimate Vacuum (Cold State)	≤ 5Pa
Temperature Control Accuracy	±0.1℃
Vacuum System	2H-150Sliding Vane Pump + Capacitance Diaphragm Vacuum Gauge for feedback control

Applications

• Aerospace: Deposition enhancement for carbon brake discs and aerospace structural components.
• Monocrystalline/Polycrystalline Silicon: Production of C/C hot zone materials (crucible supports, guide cylinders, insulation cylinders).
• Semiconductor Industry: Preparation of SiC coatings on high-purity graphite components.
• Advanced Carbon Materials: Research on the preparation of graphene and carbon nanotubes.