Overview

The dual vertical circular CVD furnace is a high-efficiency system developed by Yuanhang Industrial Furnace for the batch production of high-performance composite materials (C/C, C/SiC). This equipment introduces precursor gases into a high-temperature reaction chamber under vacuum or protective atmosphere, forming dense coatings on substrate surfaces or filling pores through chemical vapor infiltration (CVI), thereby enhancing the mechanical properties of the materials.

Image: Yuanhang Industrial Furnace - Dual Vertical Circular CVD Furnace (Actual On-Site Photo)

Features

• ?? Dual-Furnace High Efficiency: A single power supply system supports two furnaces, enabling seamless transition by allowing one furnace to heat or deposit while the other cools and unloads.
  ?? Ultra-High Temperature Environment: Operating temperature of 2000°C (max design 2100°C) ensures crystallinity and quality of deposited products.
  ?? Precision Gas Distribution: Multi-channel gas delivery system with Sevenstar mass flow controllers guarantees uniform distribution of reactive gases within the circular chamber.
  ?? Fully Automated Process Control: Siemens PLC integrated with Shimaden precision instruments enables real-time recording, querying, and historical data export of process parameters.

Specs

Applications

• • Aerospace: Deposition enhancement for carbon brake discs and aerospace structural components.
  • Monocrystalline/Polycrystalline Silicon: Production of C/C hot zone materials (crucible supports, guide cylinders, insulation cylinders).
  • Semiconductor Industry: Preparation of SiC coatings on high-purity graphite components.
  • Advanced Carbon Materials: Research on the preparation of graphene and carbon nanotubes.

Image: Yuanhang Industrial Furnace - Precision Reaction Chamber Details for CVD/CVI Process