YUAN HANG INDUSTRIAL FURNACES TECHNOLOGY 0-3200℃

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Bottom Discharge CVD/Carbonization Furnace

Bottom Discharge CVD/Carbonization Furnace

Equipment Use: Primarily used for CVD and CVI processes to produce high-performance composite materials such as C/C, C/SiC, and SiC/SiC. Core Advantages: The bottom-loading/unloading structure design greatly facilitates the handling of large-sized, heavy carbon workpieces and enables continuous production, with a maximum design temperature of 2100°C. Technical Support: Features isostatic graphite resistance heating with low-voltage, high-current control, equipped with a Siemens PLC and a 15-inch touch screen, supporting fully automatic process programming and data export.

Overview

Chemical Vapor Deposition (CVD)is a process in which precursor gases undergo thermal decomposition to generate reaction products that deposit onto a substrate, forming thin films or densifying the matrix. The bottom-discharge CVD/Carbonization Furnace developed by Yuanhang Industrial Furnace is specifically designed for applications such as carbon/carbon (C/C) composites and silicon carbide (SiC) coatings, serving as the core key equipment for achieving densification of high-performance materials.

下出料CVD气相沉积炉设备实拍

Image: Yuanhang Industrial Furnace - Bottom Discharge CVD/Carbonization Furnace in Practical Operation

Applications

  • ?Carbon Brake Discs for Civil Aircraft
    ? C/C Hot Zones for Monocrystalline Silicon Growth Furnaces
    ? Structural Components for Polycrystalline Silicon Ingot Furnaces
    ? High-Temperature C/C Structural Parts
    ? C/C-SiC Composites
    ? C/C Guide Cylinders / Insulation Cylinders / Crucible Supports

Technical Specs

Heating Method Isostatic Graphite Resistance Heating (Low-Voltage, High-Current Mode)
Design/Operating Temperature Maximum Temperature: 2100°C / Long-Term Operating Temperature: 2000°C
Temperature Control Accuracy ±0.1℃(Controlled by Shimaden (Japan) Precision Instruments)
Ultimate Vacuum ≤ 5Pa(Under Cold, Empty Furnace Condition)
Constant Pressure Control Fully automatic slight positive pressureConstant Pressure Control within the range of 100-7500 Pa
Control System Siemens PLC + 15-inch Delta Touch Screen (with Historical Data Export)
Effective Charging Space Provided in non-standard dimensions customized to customer process requirements


System Features


  1. 1.Multi-Stage Gas Circuit Management:Equipped with Beijing Sevenstar Mass Flow Controllers for precise control of precursor and protective gas flow rates.

  2. 2.High-Safety Design:Fully equipped with an audible and visual alarm system, PLC logic interlock, and multiple over-temperature protection mechanisms.

  3. 3.Customized Material Handling:Configured with dedicated bottom-discharge loading/unloading trolleys, significantly enhancing production efficiency and reducing labor intensity.

  4. 4.Precision Vacuum Control:Utilizes a combination of Pirani and capacitive diaphragm vacuum gauges to achieve full-range, high-precision vacuum measurement and feedback.



?? Yuanhang Note: The CVD/CVI process is complex, requiring rigorous reactor chamber design

and gas circuit configuration. We offer multiple size customization and technical expansion services.

Feel free to call 15115399105 for consultation.